1.5 μm process

Semiconductor
device
fabrication
MOSFET scaling
(process nodes)
  • 020 µm – 1968
  • 010 µm – 1971
  • 006 µm – 1974
  • 003 µm – 1977
  •  1.5 µm – 1981
  • 001 µm – 1984
  • 800 nm – 1987
  • 600 nm – 1990
  • 350 nm – 1993
  • 250 nm – 1996
  • 180 nm – 1999
  • 130 nm – 2001
  • 090 nm – 2003
  • 065 nm – 2005
  • 045 nm – 2007
  • 032 nm – 2009
  • 028 nm – 2010
  • 022 nm – 2012
  • 014 nm – 2014
  • 010 nm – 2016
  • 007 nm – 2018
  • 005 nm – 2020
  • 003 nm – 2022
Future
  • v
  • t
  • e

The 1.5 μm process is the level of MOSFET semiconductor process technology that was reached around 1981–1982, by leading semiconductor companies such as Intel and IBM.

Products featuring 1.5 μm manufacturing process

References

  1. ^ "Memory". STOL (Semiconductor Technology Online). Retrieved 25 June 2019.
  2. ^ "History of the Intel Microprocessor - Listoid". Archived from the original on 27 April 2015. Retrieved 19 April 2015.
  3. ^ Gealow, Jeffrey Carl (10 August 1990). "Impact of Processing Technology on DRAM Sense Amplifier Design" (PDF). Massachusetts Institute of Technology. pp. 149–166. Retrieved 25 June 2019 – via CORE.
  4. ^ Mega-CD Hardware Manual: PCM Sound Source (PDF). Sega. 14 October 1991. Retrieved 14 November 2020.
  5. ^ "Amiga Manual: Amiga 3000+ System Specification 1991".
  6. ^ Intel Corporation, "New Product Focus Components: 80286 Workhorses: Twice As Fast", Solutions, July/August 1985, Page 17
  7. ^ Intel Corporation, "NewsBit: Three New Pinouts For One-Megabit EPROMs Announced", Solutions, January/February 1986, Page 1
  8. ^ Rant, Jon; "CHMOS: Matching Process to Product", Intel Corporation, Solutions, January/February 1986, Page 17
  9. ^ Ormsby, Jon, Editor, "New Product Focus: Components: 82526 Works Magic Under The Hood", Intel Corporation, Microcomputer Solutions, May/June 1988, page 10

External links

  • Brief timeline of microprocessor development
Preceded by
3 μm process
MOSFET semiconductor device fabrication process Succeeded by
1 μm process


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